Joint Research Activities

A vital aspect of the ANNA project is the synergy in the ensemble of the proposed joint research activities. While several analytical challenges related with ULSI silicon-based device manufacturing are being confronted in the joint research activities, the overall target is to implement synergies between the partners with the aim of creating on the one hand of a multi-site European laboratory and on the other, of endorsing the collaboration between leading edge micro(nano) electronic industries (including a wafer manufacturer and an IC manufacturer in the case of the ANNA consortium) and research institutes with specific core competences in those fields of metrology that are becoming more and more critical for the future technology.

An optimal approach to any “borderline” metrology problem requires typically application of supplementary analytical techniques. Some of these are not commonly available to industry especially in situations where techniques, analytical methodologies and individual expertise are pushed to the limit in dealing with critical issues faced by industrial partners. At the same time, the availability of complementary competences is crucial for the advancement of any analytical methodology through cross-comparison, round-robin and benchmarking of results. JRAs activities cover a relatively broad spectrum of crucial topics related to metrology in silicon-based device manufacturing. They range from surface-oriented issues (surface contamination detection and quantification), ultra-thin film and shallow implants characterization and bulk defect and strain investigations. While many partners from several countries in the EU are contributing to at least one JRA due to their specific competences, the participation of every partner in more than a single research activity is fostered.